Overview
CRITONN | Critical Dimension
TARGOSS™ CRITICAL DIMENSION analyses and evaluates the dimension of single structural elements. The measurement of a feature can deliver different results: Line-Width, Side-Wall-Angle, Line-Edge-Ruffness (LER), etc. For a high yield not only the value itself but also its uniformity across the wafer and the lot are absolutely necessary.
TARGOSS™ CRITICAL DIMENSION supports the process from the base patterning (Lithography) up to the structuring processes. The automatic definition of the ETCH-BIAS or the calculation of the CD dose gradients are supported as well. In case of the dose mapping analysis the CD uniformity will be analysed and optimised by the use of freely definable models.
TARGOSS™ CRITICAL DIMENSION in combination with TARGOSS™ OVERLAY can handle a common budget for feature displacements and thus substantially reduce rework.
- CD/dose-gradient
- Picture saving
- Document attachment
- Dose map/zone analysis
- Scanner job-file export
- Compound analysis
- Interactive wafer plot
- Data consistency check
- Multi analysis
- Flyer/outlier management
