Overview
NEXTERR | Run to Run
TARGOSS™ RUN TO RUN is based on the proven integrated "business process framework". This allows the formation of a scalable and cascaded controller network.
Controller for OVERLAY, CRITICAL DIMENSION, CMP and CVD are readily available. With TARGOSS™ STUDIO individual controllers can be developed based upon existing mathematical libraries.
TARGOSS™ RUN TO RUN supports lot and waferlevel control.
The process control of OVERLAY and CRITICAL DIMENSION of special features is important to secure a high yield and a constantly high throughput in the production.
The controller for Overlay and Critical Dimension supports grid- and dose mapping.
Missing data in control loops are estimated by intelligent methodologies. Thus "send ahead wafer" can be avoided as far as possible.
- Wide range of proven algorithms
- Extendable to new functionalities based on powerful library
- Customized controller development option
- Option to apply proprietary algorithms
- Self consistency check
- Option for off-line data analysis
