Overview
OVALISS | Overlay
TARGOSS™ OVERLAY analyses and evaluates the overlay inspection data. The tolerable overlay budget is becoming tight because of continuously shrinking feature sizes. TARGOSS™ OVERLAY provides a variety of diverse and connected algorithms to satisfy today's demand. A new challenge is the immersion lithography which requires a completely new approach. This new technology extremely increases the risk that pattern displacements reduce the yield. Therefore, the accurate identification of SOV (source of variation) is going to play a more important role than it used to. TARGOSS™ OVERLAY analyses and identifies the wafer-, field- and equipment-influence. By using non linear models, the model quality and accuracy of the modeled data is very high.
TARGOSS™ OVERLAY can use TARGOSS™ RETICLE MANAGEMENT and collect information on the quality of the photo mask for analysis considerations. The high quality of analysis results and the recognition and classification of faults (FDC) via TARGOSS™ OVERLAY allows a target orientated process control by using targoss R2R.
- High order compensation
- Split and merge
- GridMap analysis – modeling – matching
- 1st layer/interlocking analysis
- Rework criteria: ISP/LIS, MMV, M3S
- Multi layer analysis
- Flyer/outlier management
- Overlay BIAS
- Focus monitor
- Tilt Analysis
- Dose analysis
- Data stacking
